Fast deposition of plasma polymer layers

Growth kinetics of plasma-polymerized films

The growth kinetics of polymer thin films prepared by plasma-based deposition method were explored using atomic force microscopy. The growth behavior of the first layer of the polythiophene somewhat differs from that of the other layers because the first layer is directly deposited on the substrate, whereas the other layers are deposited on the polymer itself. After the deposition of the first ...

Responsive plasma polymerized ultrathin nanocomposite films

The plasma polymerization of NIPAAM and titanium isopropoxide monomers into responsive ultrathin films with responsive optical properties using plasma enhanced chemical vapor deposition is reported. The composite ultrathin films possess a large window for potential changes in their refractive index from 1.60 to 1.95. We demonstrated that these polymer films exhibit fast (transition time below 2...

Diagnostics of etching plasmas *

Radio-frequency excited, low-pressure plasmas in halogen-containing gases are widely used to etch submicronic features in a range of materials during integrated circuit manufacture. Costly process-drift problems are often caused by the ubiquitous deposition of polymer layers on the reactor walls. Simple and robust sensors of the reactor performance are needed to monitor and manage these effects...

Process Optimization of Deposition Conditions for Low Temperature Thin Film Insulators used in Thin Film Transistors Displays

Deposition process for thin insulator used in polysilicon gate dielectric of thin film transistors are optimized. Silane and N2O plasma are used to form SiO2 layers at temperatures below 150 ºC. The deposition conditions as well as system operating parameters such as pressure, temperature, gas flow ratios, total flow rate and plasma power are also studied and their effects are discussed.  The p...

Fast Plasma Deposition of Carbon and Silicon Layers